Deposition chamber equipped with O2 and N2 plasma source for thin films deposition on wafers and powders.

Horizontal and vertical furnaces for annealing and diffusion

Q-switched Ruby laser for laser annealing

Two CW X-band systems for electron spin resonance (ESR) spectroscopy, electrically detected spin resonance spectroscopy (EDMR) and electron nuclear double resonance spectroscopy (ENDOR). Variable temperature measurements (4-600 K).

Multi-frequency (0.1-40 GHz) EDMR

FMR

Multi-frequency (0.1-40 GHz) FMR

Electrical: I-V, C-V, DLTS (20K-300K), Probe station

Deep-Level Transient Spectroscopy (20-300 K)

Set-up for inelastic electron tunnelling spectroscopy (IETS) working in the temperature range 4-300 K